E. Babich, J.M. Shaw, et al.
Microelectronic Engineering
Electron penetration and scattering in solids can be measured by electron beam exposure of a positive electron resist. The beam profile is obtained by exposing a long line of controlled width in a thick layer of poly-(methyl methacrylate) resist. The cross section of the developed line which can be examined in the scanning electron microscope represents the beam density profile. © 1971 The American Institute of Physics.