J.F. Kwak, J.E. Schirber, et al.
Physical Review Letters
Conducting organic π-donor halide complexes such as tetrathiafulvalene bromide were discovered to act as electron beam resists, which display a unique combination of useful properties. Exposure of sublimed films to an electron beam generates the neutral π donor and the halogen which is subsequently lost from the film. Depending on exposure conditions, either negative (solvent developed) or positive (in-situ developed) resist images with a resolution of the order of 0.5 μ can be generated. The strongly absorbing (UV,vis.) and highly conducting (∼10/Ω cm) films were found to become transmitting and insulating upon electron beam irradiation.
J.F. Kwak, J.E. Schirber, et al.
Physical Review Letters
P.M. Chaikin, G. Grüner, et al.
Physical Review Letters
J.R. Andersen, V.V. Patel, et al.
Tetrahedron Letters
S.S.P. Parkin, J.C. Scott, et al.
Physical Review B