Developer Temperature Effects on E-Beam and Optically Exposed Positive Photoresist
- J.M. Shaw
- M. Hatzakis
- 2019
- JES
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38 results for M. Hatzakis
Copolymers of Methyl Methacrylate and Methacrylic Acid and Their Metal Salts as Radiation Sensitive Resists
- Ivan Haller
- Ralph Feder
- et al.
- 2019
- JES
Organosilicon polymers for lithographic applications
- Michael Hatzakis
- 2011
- Makromolekulare Chemie. Macromolecular Symposia
Organosilicon polymers for lithographic applications
- J.M. Shaw
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Poly(4‐chlorostyrene), a new high contrast negative E‐beam resist
- J. Liutkus
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
Electron beam processing systems (a state of the art review)
- M. Hatzakis
- 2004
- Polymer Engineering & Science
Epoxy resins for deep UV lithography
- K.J. Stewart
- M. Hatzakis
- et al.
- 2004
- Polymer Engineering & Science
New method of observing electron penetration profiles in solids
- M. Hatzakis
- 2003
- Applied Physics Letters
1.75-GHz acoustic-surface-wave transducer fabricated by an electron beam
- A.N. Broers
- E.G. Lean
- et al.
- 2003
- Applied Physics Letters
Scanning differential interferometer to measure index heterogeneity
- Norman Bobroff
- Alan E. Rosenbluth
- et al.
- 1992
- Applied Optics