Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
The saturated oxide formed on Ni(001) under UHV conditions has been studied by x-ray photoelectron diffraction (XPD) and low-energy electron diffraction. At ambient temperature and with a 1200-L exposure to oxygen, the saturation oxygen coverage is found to be 4.30.4 monolayers (ML) as measured relative to the Ni(001) surface-atom density. [1 langmuir (L)==10-6 Torr sec.] The oxide is furthermore found to grow primarily as NiO(001) in a highly strained superlattice for which the horizontal lattice constant is expanded by (1/6 compared to the underlying Ni(001). The XPD results are found to be very sensitive to the degree of short-range order in the oxide before and after light annealing, particularly when obtained with high angular resolutions of approximately 1.0°. Single-scattering calculations with spherical-wave scattering are found to give an excellent description of the XPD from the annealed and more-ordered overlayer. These results also suggest the general utility of high-resolution XPD for studying the degree of short-range positional order present in epitaxial overlayers. © 1989 The American Physical Society.
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
B.A. Hutchins, T.N. Rhodin, et al.
Surface Science
A. Gangulee, F.M. D'Heurle
Thin Solid Films