W.D. Hinsberg, C.G. Willson, et al.
Proceedings of SPIE 1989
Recent developments in applications of polymers as resists in microlithography are reviewed. Emphasis is placed on the advances in materials and processes associated with current photolithographic resists designed to extend the utility of photolithography into the submicrometer regime and to ensure continued dominance of photolithographic technology in commercial manufacture of integrated circuits.
W.D. Hinsberg, C.G. Willson, et al.
Proceedings of SPIE 1989
E. Gipstein, C.G. Willson, et al.
Journal of Organic Chemistry
Scott A. MacDonald, N.J. Clecak, et al.
Microlithography 1991
D.R. McKean, W.D. Hinsberg, et al.
J. Photopolym. Sci. Tech.