Photochemical generation and deposition of copper from a gas phase precursor

C.R. Jones; F.A. Houle; C.A. Kovac; T.H. Baum

doi:10.1063/1.95811

Applied Physics Letters

Paper

01 Jan 1985

Photochemical generation and deposition of copper from a gas phase precursor

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Abstract

The photochemical generation and deposition of copper metal from a volatile copper coordination complex are described. Pulsed and cw ultraviolet light sources were used to induce deposition. The chemical compositions of the films are compared for all methods.

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Laser - assisted chemical etching

F.A. Houle

Proceedings of SPIE 1989

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Electron impact fragmentation of gases by molecular beam mass spectrometry. Application to AsCl₃ and a GaCl₃/Ga₂ Cl₆ mixture

F.A. Houle

International Journal of Mass Spectrometry and Ion Processes

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Surface processes leading to carbon contamination of photochemically deposited copper films

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JVSTA

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Metal-containing release layers for use with UV-cure nanoimprint lithographic template materials

F.A. Houle, S. Raoux, et al.

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Abstract

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