Natasha C.Us, R.W. Sadowski, et al.
Plasma Chemistry and Plasma Processing
The plasma potential of 13.56-MHz low-pressure argon glow discharges has been measured for various modes of applying the rf power in a geometrically asymmetric planar system. The plasma potential is determined from the energy distribution of positive ions incident on the grounded electrode. The voltages on the excitation electrode (target electrode) are carefully measured and the capacitive sheath approximation is used to relate these measured voltages to the measured plasma potential. This approximation is successful in most of the situations encountered in this low-pressure (20 mTorr) relatively low-power density regime. The effects of superimposing dc voltages on the excitation electrode are discussed.
Natasha C.Us, R.W. Sadowski, et al.
Plasma Chemistry and Plasma Processing
J.W. Coburn
Thin Solid Films
J.W. Coburn, Eric Kay
Journal of Macromolecular Science: Part A - Chemistry
J.W. Coburn
Thin Solid Films