New precision technique for measuring the concentration versus depth of hydrogen in solids
- W.A. Lanford
- H.P. Trautvetter
- et al.
- 2008
- Applied Physics Letters
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5 results for J. Keller
Plasma-etching processes for ULSI semiconductor circuits
- M. Armacost
- P.D. Hoh
- et al.
- 1999
- IBM J. Res. Dev
A study of CClF3/H2 reactive ion etching damage and contamination effects in silicon
- X.C. Mu
- S.J. Fonash
- et al.
- 1986
- Journal of Applied Physics
Plasma potentials of 13.56-MHz rf argon glow discharges in a planar system
- K. Köhler
- J.W. Coburn
- et al.
- 1985
- Journal of Applied Physics
Summary Abstract: Plasma potentials of 13.56 MHz rf argon glow discharges in a planar system
- K. Kehler
- J.W. Coburn
- et al.
- 1985
- JVSTA