Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
The dielectric properties are reported for nanoporous thin films of poly(methyl silsesquioxane) (MSSQ) for use as an ultralow, dielectric intermetal insulator. Direct experimental conformation is provided that the films have low dielectric constants with low loss up to 10 GHz. Low-frequency measurements are also reported.
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
G. Will, N. Masciocchi, et al.
Zeitschrift fur Kristallographie - New Crystal Structures
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry