F.A. Houle, W.D. Hinsberg, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
We present a method of resolving the nuclear and electronic contributions to the third-order susceptibility χ3 in a phase conjugation experiment. The technique is applied to octylmethylpolysilane yielding χ3 (electronic)=(1.8±0.5)×10-12 esu and χ3(nuclear)=(1.1±0.4) ×10-12 esu at 532 nm.
F.A. Houle, W.D. Hinsberg, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
G.M. Wallraff, W.D. Hinsberg, et al.
Microlithography 1995
G.M. Wallraff, T. Nguyen, et al.
CHEMTECH
R.D. Miller, G.M. Wallraff, et al.
SPE Regional Technical Conference 1988