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JVSTA
Paper
01 Jan 1985

Summary Abstract: Titanium silicide films prepared by reactive sputtering

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Abstract

No abstract available.

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Date

01 Jan 1985

Publication

JVSTA

Authors

  • V. Deline
  • F.M. d’Heurle
IBM-affiliated at time of publication

Topics

  • Physical Sciences
  • Materials Discovery

Resources

  • Publication

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