Conference paperGraded spin-on organic bottom antireflective coating for high NA lithographyDario L. Goldfarb, Sean D. Burns, et al.SPIE Advanced Lithography 2008
PaperPatterning of hyperbranched resist materials by electron-beam lithographyAlexander R. Trimble, David C. Tully, et al.American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
PaperRecent advances in the development of chemically amplified resists for applications in electron beam lithographyDavid R. MedeirosJ. Photopolym. Sci. Tech.
PaperBilayer resists for 193 nm lithography: SSQ and POSSHiroshi Ito, Hoa D. Truong, et al.J. Photopolym. Sci. Tech.
