Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
The 300 K kinetics of dissociative chemisorption and oxide island nucleation and growth are compared for Ni(100) and Ni(111). We conclude that the behavior of oxygen sticking probability as a function of coverage can be understood in terms of direct Langmuir adsorption (no molecular diffusion) and the availability of active empty clusters of adsorption sites of certain sizes and configurations. © 1985, American Vacuum Society. All rights reserved.
Heinz Schmid, Hans Biebuyck, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
Frank Stem
C R C Critical Reviews in Solid State Sciences
F.J. Himpsel, T.A. Jung, et al.
Surface Review and Letters