HEATING EFFECT IN HIGHLY CONDUCTING MATERIALS DURING PLASMA ETCHING.
- Y.H. Lee
- M. Chen
- 1983
- ECS Meeting 1983
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14 results for M. Chen
ETCH ANISOTROPY OF UNDOPED POLYSILICON FILMS.
- D. Favreau
- M. Chen
- et al.
- 1983
- ECS Meeting 1983
THRESHOLD CHARACTERISTICS OF MUTUALLY COUPLED SQUIDS.
- C.C. Chi
- L. Krusin-Elbaum
- et al.
- 1983
- International Conference on Low Temperature Physics (LT) 1983
WELL COUPLED dc SQUID WITH EXTREMELY LOW 1/F NOISE.
- C.D. Tesche
- K.H. Brown
- et al.
- 1983
- International Conference on Low Temperature Physics (LT) 1983
Etching Silicon with Fluorine Gas
- M. Chen
- V.J. Minkiewicz
- et al.
- 2019
- JES
Heating Effects In Reactive Etching Of Nb And Nb205
- Young H. Lee
- 2019
- JES
Magnetic field control of reactive plasma etching
- V.J. Minkiewicz
- M. Chen
- et al.
- 2008
- Applied Physics Letters
Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle density
- J.W. Coburn
- M. Chen
- 2008
- Journal of Applied Physics
I-V characteristics of microwave-driven Josephson junctions in the low-frequency and high-damping regime
- C. Vanneste
- C.C. Chi
- et al.
- 1985
- Physical Review B
Doping effects in reactive plasma etching of heavily doped silicon
- Young H. Lee
- Mao-Min Chen
- et al.
- 1985
- Applied Physics Letters