Chemical amplification resists: History and development within IBM
- Hiroshi Ito
- 1997
- IBM J. Res. Dev
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127 results for Hiroshi Ito
A new positive DUV photoresist optimized for 0.25 μm isolated lines
- T. Lindsay
- G.G. Barclay
- et al.
- 1997
- Microelectronic Engineering
Preparation of lithographic resist materials by anionic polymerization
- Hiroshi Ito
- 1996
- American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Advances in chemical amplification resist systems
- Hiroshi Ito
- 1992
- Japanese Journal of Applied Physics
Resist materials
- Scott A. MacDonald
- Jean M.J. Frechet
- et al.
- 1985
- Microelectronic Engineering
Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystyrene resins
- Jean M.J. Fréchet
- Eva Eichler
- et al.
- 1983
- Polymer
Advances in the design of organic resist materials
- Scott A. MacDonald
- Hiroshi Ito
- et al.
- 1983
- Microelectronic Engineering