X-ray absorption spectroscopy to probe surface composition and surface deprotection in photoresist films
- Joseph L. Lenhart
- Daniel A. Fischer
- et al.
- 2005
- Langmuir
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109 results for Marie Angelopoulos
Water immersion of model photoresists: Interfacial influences on water concentration and surface morphology
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2005
- Journal of Microlithography, Microfabrication and Microsystems
Conducting polymers as lithographic materials
- Marie Angelopoulos
- Jane M. Shaw
- et al.
- 2004
- Polymer Engineering & Science
Formation of deprotected fuzzy blobs in chemically amplified resists
- Ronald L. Jones
- Tengjiao Hu
- et al.
- 2004
- Journal of Polymer Science, Part B: Polymer Physics
Interfacial effects on moisture absorption in thin polymer films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Langmuir
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
- Dario L. Goldfarb
- Arpan P. Mahorowala
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Incoherent neutron scattering and the dynamics of thin film photoresist polymers
- Christopher L. Soles
- Jack F. Douglas
- et al.
- 2003
- Journal of Applied Physics
Probing surface and bulk chemistry in resist films using near edge x-ray absorption fine structure
- Joseph L. Lenhart
- Ronald L. Jones
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Combinatorial methodologies offer potential for rapid research of photoresist materials and formulations
- Joseph L. Lenhart
- Ronald L. Jones
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering