FinFET resistance mitigation through design and process optimization
- Cindy Wang
- Josephine Chang
- et al.
- 2009
- VLSI-TSA 2009
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27 results for Omer H. Dokumaci
FinFET performance advantage at 22nm: An AC perspective
- M. Guillorn
- J. Chang
- et al.
- 2008
- VLSI Technology 2008
Simulation study of multiple FIN FinFET design for 32nm technology node and beyond
- Xinlin Wang
- Andres Bryant
- et al.
- 2007
- SISPAD 2007
Ultra-thin SOI CMOS using laser spike anneal
- Zhibin Ren
- J. Sleight
- et al.
- 2006
- VLSI-TSA 2006
Effect of contact liner stress in high-performance FDSOI devices with ultra-thin silicon channels and 30 nm gate lengths
- D. Singh
- J. Hergenrother
- et al.
- 2005
- IEEE International SOI Conference 2005
Retardation of arsenic diffusion in silicon-germanium by co-implantation
- Omer Dokumaci
- Paul Ronsheim
- et al.
- 2004
- ECS Meeting 2004
A Simplified Hybrid Orientation Technology (SHOT) for high performance CMOS
- B. Doris
- Y. Zhang
- et al.
- 2004
- VLSI Technology 2004
Modeling of the diffusion of implanted boron in strained Si/Si1-xGex
- Huilong Zhu
- Kam-Leung Lee
- et al.
- 2002
- SISPAD 2002
High performance of planar double gate MOSFETs with thin backgate dielectrics
- E.C. Jones
- M. Ieong
- et al.
- 2001
- DRC 2001
Silicon CMOS devices beyond scaling
- Wilfried Haensch
- Edward J. Nowak
- et al.
- 2006
- IBM J. Res. Dev