Dual work function metal gate CMOS using CVD metal electrodesV. NarayananA.C. Callegariet al.2004VLSI Technology 2004
A Simplified Hybrid Orientation Technology (SHOT) for high performance CMOSB. DorisY. Zhanget al.2004VLSI Technology 2004
Channel design and mobility enhancement in strained germanium buried channel MOSFETsH. ShangJ.O. Chuet al.2004VLSI Technology 2004
On the integration of CMOS with hybrid crystal orientationsM. YangV. Chanet al.2004VLSI Technology 2004
Three dimensional CMOS devices and integrated circuitsMeikei IeongKathryn W. Guariniet al.2003CICC 2003
Recent progress in devices and materials for CMOS technologyH.-S. Philip WongB. Doriset al.2003VLSI-TSA 2003
Integration of 1GB/sec Silicon Lateral Trench Photodetector with High-Performance CMOSM. YangJ. Schaubet al.2003VLSI Technology 2003
Strained Si CMOS (SS CMOS) technology: Opportunities and challengesK. RimR. Andersonet al.2003Solid-State Electronics