Chain conformation in ultrathin polymer films
- Ronald L. Jones
- Christopher L. Soles
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
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69 results for Dario Goldfarb
Thin film confinement effects on the thermal properties of model photoresist polymers
- Christopher L. Soles
- Eric K. Lin
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Confinement effects on the spatial extent of the reaction front in ultrathin chemically amplified photoresists
- Darío L. Goldfarb
- Marie Angelopoulos
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Image collapse issues in photoresist
- John Simons
- Dario Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
High resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of thin and ultrathin polymer and resist films
- Dario L. Goldfarb
- Qinhuang Lin
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Line edge roughness in positive-tone chemically amplified resists: Effect of additives and processing conditions
- Qinghuang Lin
- Dario L. Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Novel Si-based composite thin films for 193/157 nm attenuated phase shift mask(APSM) applications
- S. Jay Chey
- C.R. Guarnieri
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse
- Darío L. Goldfarb
- Juan J. De Pablo
- et al.
- 2000
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures