Optimization of 3nm High Performance Nanosheet Technology for 77 K OperationJulien FrougierRuqiang Baoet al.2025GOMACTech 2025
Advanced Multi-Vt Enabled by Selective Layer Reductions for 2nm Nanosheet Technology and BeyondRuqiang BaoYusuke Onikiet al.2024IEDM 2024
Epi Source-Drain Damage Mitigation During Channel Release of Stacked Nanosheet Gate-All-Around TransistorsCurtis DurfeeIvo Ottoet al.2023ECS Meeting 2023
Epi Source/Drain Damage Mitigation with Inner Spacer and Buffer Optimization in Stacked Nanosheet Gate-All-Around TransistorsCurtis DurfeeIvo Ottoet al.2023SSDM 2023
Hardware Based Performance Assessment of Vertical-Transport Nanosheet TechnologyGen TsutsuiSeunghyun Songet al.2022IEDM 2022