Publications

199 results for Vijay Narayanan

Ruthenium based metals using atomic vapor deposition for gate electrode applications
- - Changhwan Choi
  - Takashi Ando
  - et al.
- 2011
- Applied Physics Letters
Epitaxial SrO interfacial layers for HfO₂ -Si gate stack scaling
- - Chiara Marchiori
  - Martin M. Frank
  - et al.
- 2011
- Applied Physics Letters
Physical origins of mobility degradation in extremely scaled SiO ₂ / HfO₂ gate stacks with la and Al induced dipoles
- - Takashi Ando
  - Matt Copel
  - et al.
- 2010
- Applied Physics Letters
High-κ/metal-gate fully depleted SOI CMOS with single-silicide schottky source/drain with sub-30-nm gate length
- - Marwan H. Khater
  - Zhen Zhang
  - et al.
- 2010
- IEEE Electron Device Letters
Temperature-dependent La- and Al-induced dipole behavior monitored by femtosecond pump/probe photoelectron spectroscopy
- - Hiroaki Arimura
  - Richard Haight
  - et al.
- 2010
- Applied Physics Letters
Oxygen migration in TiO₂-based higher-k gate stacks
- - Sangbum Kim
  - Stephen L. Brown
  - et al.
- 2010
- Journal of Applied Physics
Ultimate EOT scaling (< 5Å) using Hf-based high-κ gate dielectrics and impact on carrier mobility
- - Takashi Ando
  - Martin M. Frank
  - et al.
- 2010
- ECS Transactions
Methodology of ALD HfO₂ high-κ gate dielectric optimization by cyclic depositions and anneals
- - H. Jagannathan
  - Robert D. Clark
  - et al.
- 2010
- ECS Transactions
Oxygen transport in high-κ/ metal gate stacks and physical characterization by SIMS using isotope labeled oxygen
- - Marinus Hopstaken
  - John Bruley
  - et al.
- 2010
- ECS Transactions
Optimizing band-edge high-κ/metal gate n-MOSFETs with ALD lanthanum oxide cap layers-oxidant and positioning effects
- - Robert D. Clark
  - H. Jagannathan
  - et al.
- 2010
- ECS Transactions