Silicide challenges for 22nm technologies and beyond
- Paul R. Besser
- Christian Lavoie
- et al.
- 2008
- ECS Meeting 2008
Publications
201 results for Christian Lavoie
Nucleation and diffusion during growth of ternary Co1-x Nix Si2 thin films studied by complementary techniques in real time
- D. Smeets
- J. Demeulemeester
- et al.
- 2008
- Journal of Applied Physics
Material and integration issues for rare-Earth Silicides as gate and diffusion contacts in advanced CMOS
- C. D'Emic
- K. Ohuchi
- et al.
- 2008
- ECS Meeting 2008
FinFET performance advantage at 22nm: An AC perspective
- M. Guillorn
- J. Chang
- et al.
- 2008
- VLSI Technology 2008
Effect of Pt addition on growth stress and thermal stress of NiSi films
- C. Van Bockstael
- K. De Keyser
- et al.
- 2008
- Journal of Applied Physics
Extendibility of NiPt silicide to the 22-nm node CMOS technology
- Kazuya Ohuchi
- Christian Lavoie
- et al.
- 2008
- IWJT 2008
Epitaxial formation of a metastable hexagonal nickel-silicide
- K. De Keyser
- C. Van Bockstael
- et al.
- 2008
- Electrochemical and Solid-State Letters
Texture of NiSi films on Si(001), (111), and (110) substrates
- C. Detavernier
- J.L. Jordan-Sweet
- et al.
- 2008
- Journal of Applied Physics
In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon
- W. Knaepen
- C. Detavernier
- et al.
- 2008
- Thin Solid Films
The role of lattice mismatch and kinetics in texture development: Co 1-xNixSi2 thin films on Si(100)
- D. Smeets
- A. Vantomme
- et al.
- 2008
- Journal of Applied Physics