Trilayer process for T -gate and Γ-gate lithography using ternary developer and proximity effect correction superposition
- Leonidas E. Ocola
- James Bucchignano
- et al.
- 2022
- Journal of Vacuum Science and Technology B
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53 results for Jim Bucchignano
Intrinsically ultrastrong plasmon–exciton interactions in crystallized films of carbon nanotubes
- Po Hsun Ho
- Damon B. Farmer
- et al.
- 2018
- PNAS
High chi block copolymer DSA to improve pattern quality for FinFET device fabrication
- Hsinyu Tsai
- Hiroyuki Miyazoe
- et al.
- 2016
- SPIE Advanced Lithography 2016
Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch
- Hsinyu Tsai
- Hiroyuki Miyazoe
- et al.
- 2015
- SPIE Advanced Lithography 2015
Electrical characterization of FinFETs with fins formed by directed self assembly at 29 nm fin pitch using a self-aligned fin customization scheme
- Hsinyu Tsai
- Hiroyuki Miyazoe
- et al.
- 2014
- IEDM 2014
Two-dimensional pattern formation using graphoepitaxy of PS-b-PMMA block copolymers for advanced FinFET device and circuit fabrication
- Hsinyu Tsai
- Jed W. Pitera
- et al.
- 2014
- ACS Nano
200 mm wafer-scale integration of sub-20 nm sacrificial nanofluidic channels for manipulating and imaging single DNA molecules
- C. Wang
- S.W. Nam
- et al.
- 2013
- IEDM 2013
Dot-matrix marks for dynamic overlay measurements in electron beam lithography
- Ernst Kratschmer
- James J. Bucchignano
- et al.
- 2013
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Graphene radio frequency devices on flexible substrate
- Wenjuan Zhu
- Damon B. Farmer
- et al.
- 2013
- Applied Physics Letters
Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- SPIE Advanced Lithography 2013