Simple fabrication scheme for sub-10 nm electrode gaps using electron-beam lithography
- K. Liu
- Ph. Avouris
- et al.
- 2002
- Applied Physics Letters
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53 results for Jim Bucchignano
Extending the performance of KRS-XE for high throughput electron beam lithography for advanced mask making
- David R. Medeiros
- Karen E. Petrillo
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Triple-self-aligned, planar double-gate MOSFETs: Devices and circuits
- K.W. Guarini
- P. Solomon
- et al.
- 2001
- Technical Digest-International Electron Devices Meeting
Observation of magnetic switching in submicron magnetic-tunnel junctions at low frequency
- Y. Lu
- P.L. Trouilloud
- et al.
- 1999
- Journal of Applied Physics
Chemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications
- Karen Petrillo
- James Bucchignano
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Ultrasonic and dip resist development processes for 50 nm device fabrication
- K.L. Lee
- J. Bucchignano
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Spatially confined chemistry: Fabrication of Ge quantum dot arrays
- J.R. Heath
- R.S. Williams
- et al.
- 1996
- Journal of Physical Chemistry
Lithography and fabrication processes for sub-100 nm scale complementary metal-oxide semiconductor
- S.J. Wind
- Y. Taur
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
In situ x-ray diffraction analysis of the C49-C54 titanium silicide phase transformation in narrow lines
- R.A. Roy
- L. Clevenger
- et al.
- 1995
- Applied Physics Letters
Minimum critical length for superconductivity in one-dimensional wires
- C.C. Chi
- P. Santhanam
- et al.
- 1994
- Physical Review B