Optimization of high κ gate stacks with poly-Si, FUSI and metal electrodes
- R. Jammy
- V. Narayanan
- et al.
- 2005
- ISTC 2005
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150 results for Matthew Copel
Poly-Si/high-k gate stacks with near-ideal threshold voltage and mobility
- M.M. Frank
- V.K. Paruchuri
- et al.
- 2005
- VLSI-TSA 2005
High mobility solution-deposited chalcogenide films for flexible applications
- David B. Mitzi
- Delia J. Milliron
- et al.
- 2005
- VLSI Technology 2005
Materials interaction at the nanoscale in high-k metal gate stacks: The role of oxygen
- S. Guha
- E.J. Preisler
- et al.
- 2005
- ECS Meeting 2005
High resolution profiling using ion scattering and resonant nuclear reactions
- R.P. Pezzi
- R.M. Wallace
- et al.
- 2005
- International Conference on Characterization and Metrology for ULSI Technology 2005
Systematic study of pFET Vt with Hf-based gate stacks with poly-Si and FUSI gates
- E. Cartier
- V. Narayanan
- et al.
- 2004
- VLSI Technology 2004
Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications
- E. Gusev
- C. Cabral Jr.
- et al.
- 2003
- Microelectronic Engineering
Epitaxial Si films grown on lattice matched (LaxY 1-x)O3/Si (111) structures by molecular beam epitaxy
- V. Narayanan
- S. Guha
- et al.
- 2002
- MRS Proceedings 2002
Ultrathin high-K metal oxides on silicon: Processing, characterization and integration issues
- E. Gusev
- E. Cartier
- et al.
- 2001
- Microelectronic Engineering
Optimizing fabrication of buried oxide channel field effect transistors
- A.G. Schrott
- J. Misewich
- et al.
- 2000
- MRS Proceedings 2000