Layered TaSiN as an oxidation resistant electrically conductive barrier
- A. Grill
- C.V. Jahnes
- et al.
- 1999
- Journal of Materials Research
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162 results for Cyril Cabral
(Ba,Sr)TiO3 dielectrics for future stacked-capacitor DRAM
- D.E. Kotecki
- J.D. Baniecki
- et al.
- 1999
- IBM J. Res. Dev
Evidence of a two-stage reaction mechanism in sputter deposited Nb/Al multilayer thin-films studied by in situ synchrotron X-ray diffraction
- G.A. Lucadamo
- K. Barmak
- et al.
- 1999
- Materials Letters
Effects of annealing conditions on charge loss mechanisms in MOCVD Ba0·7Sr0·3TiO3 thin film capacitors
- J.D. Baniecki
- R.B. Laibowitz
- et al.
- 1999
- Journal of the European Ceramic Society
Mechanisms for microstructure evolution in electroplated copper thin films near room temperature
- J.M.E. Harper
- C. Cabral Jr.
- et al.
- 1999
- Journal of Applied Physics
Enhanced thermal stability of C49 TiSi2 in the presence of aluminum
- S.-L. Zhang
- F.M. D'Heurle
- et al.
- 1998
- Applied Physics Letters
Evaluation of Al(Nd)-alloy films for application to thin-film-transistor liquid crystal displays
- H. Takatsuji
- E.G. Colgan
- et al.
- 1998
- IBM J. Res. Dev
Interdiffusion and phase formation in Cu(Sn) alloy films
- L. Clevenger
- B. Arcot
- et al.
- 1998
- Journal of Applied Physics
Low temperature formation of C54-TiSi2 using titanium alloys
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1997
- Applied Physics Letters
Lowering the formation temperature of the C54-TiSi2 phase using a metallic interfacial layer
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1997
- Journal of Materials Research