Pattern transfer of directed self-assembly patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
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56 results for Joy Y. Cheng
Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Topographically directed self-assembly of goldnanoparticles
- Qiu Dai
- Charles T. Rettner
- et al.
- 2011
- Journal of Materials Chemistry
Blends of PS-PMMA diblock copolymers with a directionally hydrogen bonding polymer additive
- Ankit Vora
- Baoqing Zhao
- et al.
- 2010
- Macromolecules
Facile postpolymerization end-modification of RAFT polymers
- Jason M. Spruell
- Benjamin A. Levy
- et al.
- 2008
- J Polym Sci Part A
Si-containing block copolymers for self-assembled nanolithography
- C.A. Ross
- Y.S. Jung
- et al.
- 2008
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Patterning sub-10 nm line patterns from a block copolymer hybrid
- Sang-Min Park
- Oun-Ho Park
- et al.
- 2008
- Nanotechnology
Multilayer magnetic antidot arrays from block copolymer templates
- V.P. Chuang
- W. Jung
- et al.
- 2008
- Journal of Applied Physics
Polymer self assembly in semiconductor microelectronics
- Charles T. Black
- Ricardo Ruiz
- et al.
- 2007
- IBM J. Res. Dev
Rapid directed self assembly of lamellar microdomains from a block copolymer containing hybrid
- Joy Y. Cheng
- Jed Pitera
- et al.
- 2007
- Applied Physics Letters