IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
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28 results for Pushkara Rao Varanasi
Novel classes of cyclic olefin polymers for 193 nm lithography
- P. Rao Varanasi
- R.D. Allen
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Dissolution/swelling behavior of cycloolefin polymers in aqueous base
- Hiroshi Ito
- R.D. Allen
- et al.
- 2000
- Microlithography 2000
Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Polymer chemistry considerations in the design of robust 193 nm photoresists
- R.D. Allen
- Hiroshi Ito
- et al.
- 1999
- ACS Spring 1999
Cyclic olefm resist polymers and polymerizations for improved etch resistance
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- J. Photopolym. Sci. Tech.
IBM 193nm semiconductor resist: Material properties, resist characteristics and lithographic performance
- P. Rao Varanasi
- Ann Marie Mewherter
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Advanced negative resists using novel aminoplast crosslinkers
- Ali Afzali-Kushaa
- Jeffrey D. Gelorme
- et al.
- 1998
- Microlithography 1998