A. Reisman, M. Berkenblit, et al.
JES
This paper will describe the strengths and unique challenges of building 193nm resists from acrylic polymers and cyclic olefin polymers. In particular, cyclic olefm (alternating) copolymer synthesis and properties will be discussed. ©1999TAPJ.
A. Reisman, M. Berkenblit, et al.
JES
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
Michiel Sprik
Journal of Physics Condensed Matter
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ACS Macro Letters