Diazopolysiloxanes: Unique imageable barrier layers
- E. Babich
- J.M. Shaw
- et al.
- 1986
- Microelectronic Engineering
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38 results for M. Hatzakis
A comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers
- E. Babich
- J. Paraszczak
- et al.
- 1985
- Microelectronic Engineering
Polysiloxanes for deep UV lithography
- J.M. Shaw
- M. Hatzakis
- et al.
- 1985
- Microelectronic Engineering
Methods of creation and effect of microwave plasmas upon the etching of polymers and silicon
- J. Paraszczak
- J. Heidenreich
- et al.
- 1985
- Microelectronic Engineering
SUMMARY ABSTRACT: CHARACTERISTICS OF ORGANOSILICON POLYMERS IMMERSED IN GASEOUS PLASMAS.
- J. Paraszczak
- E. Babich
- et al.
- 1984
- Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
POLYSILOXANE RESIST AS A PROBE FOR ENERGY DEPOSITED IN ELECTRON BEAM EXPOSED RESISTS.
- D. Kern
- J. Paraszczak
- et al.
- 1982
- Microcircuit Engineering 1982
Multilayer resist systems using polysiloxanes as etch masks
- J. Paraszczak
- J.M. Shaw
- et al.
- 1983
- Microlithography 1983
Resists for Fine-Line Lithography
- Michael Hatzakis
- 1983
- Proceedings of the IEEE
Organic conductors as electron beam resist materials
- Y. Tomkiewicz
- E.M. Engler
- et al.
- 1982
- Applied Physics Letters
1 μm MOSFET VLSI Technology: Part VI—Electron-Beam Lithography
- Warren D. Grobman
- Hans E. Luhn
- et al.
- 1979
- IEEE T-ED