Activation energy for C94 and C54 TiSi2 formation measured during rapid thermal annealing
- E.G. Colgan
- L. Clevenger
- et al.
- 1994
- Applied Physics Letters
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84 results for Lawrence Clevenger
Comparison of high vacuum and ultra-high-vacuum tantalum diffusion barrier performance against copper penetration
- L. Clevenger
- N.A. Bojarczuk
- et al.
- 1993
- Journal of Applied Physics
The C49 to C54-TiSi2 transformation in self-aligned silicide applications
- R. Mann
- L. Clevenger
- et al.
- 1993
- Journal of Applied Physics
Crystallization of coevaporated and ion-irradiated amorphous CoSi 2
- Q.Z. Hong
- K. Barmak
- et al.
- 1993
- Journal of Applied Physics
Electrical Resistance and Stress of Bilayer Co(P)/Cu and Ni(P)/Cu Thin Films
- M. Paunovic
- L. Clevenger
- et al.
- 1993
- JES
Kinetic analysis of C49-TiSi2 and C54-TiSi2 formation at rapid thermal annealing rates
- L. Clevenger
- J.M.E. Harper
- et al.
- 1992
- Journal of Applied Physics
The relationship between deposition conditions, the beta to alpha phase transformation, and stress relaxation in tantalum thin films
- L. Clevenger
- A. Mutscheller
- et al.
- 1992
- Journal of Applied Physics
Crystallization of amorphous Co-Si alloys
- Q.Z. Hong
- K. Barmak
- et al.
- 1992
- Journal of Applied Physics
Nucleation of an intermetallic at thin-film interfaces: VSi2 contrasted with Al3Ni
- E. Ma
- L. Clevenger
- et al.
- 1992
- Journal of Materials Research
Nucleation and growth during reactions in multilayer Al/Ni films: The early stage of Al3Ni formation
- E. Ma
- C.V. Thompson
- et al.
- 1991
- Journal of Applied Physics