An Explanation of the Electrochromism of Lutetium Diphthalocyanine
- G.A. Corker
- B. Grant
- et al.
- 2019
- JES
Publications
Date
Featured collections
Popular topics
29 results for N.J. Clecak
Design of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
Polysilanes: Photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 2004
- Polymer Engineering & Science
Azide photoresists for projection photolithography
- N.J. Clecak
- R.J. Cox
- et al.
- 2004
- Polymer Engineering & Science
Plasma-Developable Photoresist Systems Based on Chemical Amplification
- Scott A. MacDonald
- Hiroshi Ito
- et al.
- 2002
- Chemistry of Materials
Study of the Electrochromism of Methoxyfluorene Compounds
- Barbara Grant
- N.J. Clecak
- et al.
- 2002
- Journal of Organic Chemistry
Characterization of a Novolac-Based Three-Component Deep-UV Resist
- Dennis R. McKean
- Scott A. MacDonald
- et al.
- 2002
- Chemistry of Materials
Synthesis and Proof of Structure of 2,6-Diaminobenzo [1,2-d: 4,5-d′]bisthiazole
- S.L. Solar
- R.J. Cox
- et al.
- 2002
- Journal of Organic Chemistry
A Positive Tone Plasma-Developable Resist Obtained by Gas-Phase Image Reversal
- Scott A. MacDonald
- Nicholas J. Clecak
- et al.
- 2002
- Chemistry of Materials
Airborne Contamination of a Chemically Amplified Resist. 2. Effect of Polymer Film Properties on Contamination Rate
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1994
- Chemistry of Materials