Fast continuous fourier and haar transforms of rectilinear polygons from very-large-scale integration layouts
- Robin Scheibler
- Paul Hurley
- et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
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28 results at J. Micro/Nanolithogr. MEMS MOEMS
Methods for joint optimization of mask and design targets for improving lithographic process window
- Shayak Banerjee
- Kanak B. Agarwal
- et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
Pattern transfer of directed self-assembly patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
Shape slack: A design-manufacturing co-optimization methodology using tolerance information
- Shayak Banerjee
- Kanak B. Agarwal
- et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
Dose-focus monitor technique using a critical-dimension scanning electron microscope and its application to local variation analysis
- Shoji Hotta
- Timothy Brunner
- et al.
- 2012
- J. Micro/Nanolithogr. MEMS MOEMS
Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes
- Shoji Hotta
- Takumichi Sutani
- et al.
- 2011
- J. Micro/Nanolithogr. MEMS MOEMS
22-nm-node technology active-layer patterning for planar transistor devices
- Ryoung-Han Kim
- Steven Holmes
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- Greg McIntyre
- Michael Hibbs
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS