Minimal-storage high-performance Cholesky factorization via blocking and recursionFred G. GustavsonIsak Jonsson2000IBM J. Res. Dev
Low-temperature Si and Si:Ge epitaxy by uitrahigh-vacuum/ chemical vapor deposition: Process fundamentalsB.S. Meyerson2000IBM J. Res. Dev
Reduction of electromigration in aluminum films by copper dopingIrving AmesFrancois M. D'Heurleet al.2000IBM J. Res. Dev