Publications

19 results at IEDM 2018

Advanced Arsenic Doped Epitaxial Growth for Source Drain Extension Formation in Scaled FinFET Devices
- - Shogo Mochizuki
  - B. Colombeau
  - et al.
- 2018
- IEDM 2018
Novel Materials and Processes in Replacement Metal Gate for Advanced CMOS Technology
- - Ruqiang Bao
  - Steven Hung
  - et al.
- 2018
- IEDM 2018
Extendable and Manufacturable Volume-less Multi-Vt Solution for 7nm Technology Node and beyond
- - Ruqiang Bao
  - Huimei Zhou
  - et al.
- 2018
- IEDM 2018
Toward High Performance SiGe Channel CMOS: Design of High Electron Mobility in SiGe nFinFETs Outperforming Si
- - Choonghyun Lee
  - Richard G. Southwick
  - et al.
- 2018
- IEDM 2018
Parasitic Resistance Reduction Strategies for Advanced CMOS FinFETs beyond 7nm
- - Heng Wu
  - Oleg Gluschenkov
  - et al.
- 2018
- IEDM 2018
High Performance Quantum Well InGaAs-On-Si MOSFETs with sub-20 nm Gate Length for RF Applications
- - C. B. Zota
  - Clarissa Convertino
  - et al.
- 2018
- IEDM 2018
External Resistance Reduction by Nanosecond Laser Anneal in Si/SiGe CMOS Technology
- - Oleg Gluschenkov
  - Heng Wu
  - et al.
- 2018
- IEDM 2018
ECRAM as Scalable Synaptic Cell for High-Speed, Low-Power Neuromorphic Computing
- - Jianshi Tang
  - Douglas M. Bishop
  - et al.
- 2018
- IEDM 2018
Analog Computing for Deep Learning: Algorithms, Materials Architectures
- - Wilfried Haensch
- 2018
- IEDM 2018
System Performance: From Enterprise to AI
- - Arvind Kumar
  - Leland Chang
  - et al.
- 2018
- IEDM 2018