A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
An anisotropic growth of nanostructures was observed when germanium was electroplated on a patterned silicon substrate from a nonaqueous solution. Instead of an isotropic growth of mushroom cap expected for electroplating through mask, wire-shaped and wall-shaped structures were obtained, respectively, on via and stripe patterns on silicon substrate. The presence of water in the electrolyte and a high current density were found critical to the anisotropic growth. A passivation of outer surface of the deposit is believed to be involved and prohibits the lateral growth of the deposit. © 2007 The Electrochemical Society.
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules
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SPIE Advanced Lithography 2008