Conference paper
Doping of n+ and p+ polysilicon in a dual-gate CMOS process
C.Y. Wong, J.Y.-C. Sun, et al.
IEDM 1988
A new method for measuring the output (ID-VD) characteristics of SOI MOSFET's without self-heating is described. The method uses short pulses with a low repetition rate, and a reverse transient loadline construction. The technique is demonstrated by measuring 0.25 µm bulk and SOI MOSFET's with 5-nm gate oxide. Application of the method to the extraction of device temperature as a function of dc power is also illustrated. © 1995 IEEE
C.Y. Wong, J.Y.-C. Sun, et al.
IEDM 1988
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IEDM 2004
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