J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
We describe how the unique capabilities of molecular beam epitaxy together with the electron-beam lithography and reactive-ion etching can be utilized to realize novel quasi-one- and zero-dimensional electron systems. We also present the results of capacitive and tunneling studies on these quantum systems. © 1989.
J. Paraszczak, J.M. Shaw, et al.
Micro and Nano Engineering
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
David B. Mitzi
Journal of Materials Chemistry