Chai Wah Wu
Linear Algebra and Its Applications
We have designed and developed an aqueous base soluble polymer system with a silsesquioxane (SSQ) backbone for 157 nm bilayer resist applications. These base resins have absorbances as low as 0.6 μm-1 at 157 nm. The imagable polymers which contain acid-labile ester functionalities have absorbances between 2.0 and 3.0 μm-1. The silicon content of these polymers is around 15% by weight. Therefore, our polymers can be utilized in 157 nm positive bilayer resist applications with a film thickness of around 150 nm. We have evaluated several resist formulations based on these polymers. These resist formulations have shown high contrast and excellent resolution. © 2001 SPIE - The International Society for Optical Engineering.
Chai Wah Wu
Linear Algebra and Its Applications
David W. Jacobs, Daphna Weinshall, et al.
IEEE Transactions on Pattern Analysis and Machine Intelligence
Minghong Fang, Zifan Zhang, et al.
CCS 2024
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997