K.W. Guarini, P. Solomon, et al.
Technical Digest-International Electron Devices Meeting
An innovative and simple method, based on electron-beam (e-beam) overlapping and overexposure techniques, is developed to fabricate sub-10 nm electrode gaps with very good electrical properties. Gaps with 4 to 10 nm spacing can be fabricated using a proper e-beam dose and pattern-developing time. The fabrication yield is nearly 100% for 8-9 nm gaps, but significantly smaller for 3-4 nm gaps. The gap leakage resistance is around 10 12-1013, implying very good isolation. As an example, we present a transport study on a single 8 nm Co particle junction using a 10 nm gap. © 2002 American Institute of Physics.
K.W. Guarini, P. Solomon, et al.
Technical Digest-International Electron Devices Meeting
R.A. Roy, L. Clevenger, et al.
Applied Physics Letters
K.L. Lee, D. Boyd, et al.
ESSDERC 2001
E.T. Foley, A.F. Kam, et al.
Physical Review Letters