Conference paperEnergy density and temperature calibration for feol nanosecond laser annealingYasir Sulehria, Oleg Gluschenkov, et al.ASMC 2020
Conference paperIntegrated dual SPE processes with low contact resistivity for future CMOS technologiesHeng Wu, Soon-Cheon Seo, et al.IEDM 2017
PaperIntrinsic effective mobility extraction with extremely scaled gate dielectricsZuoguang Liu, Dechao Guo, et al.Applied Physics Letters
Conference paperSimulation of 3D Doping by Plasma Immersion Ion Implantation for FinFET or deep Trench Doping Applications. Effect of main Process Parameters and Study of Wall Doping Non-Uniformity as Function of Form Factor and Device ScalingFrank Torregrosa, Benjamin Roux, et al.IIT 2018
