Conference paperParasitic Resistance Reduction Strategies for Advanced CMOS FinFETs beyond 7nmHeng Wu, Oleg Gluschenkov, et al.IEDM 2018
Conference paperIntegrated dual SPE processes with low contact resistivity for future CMOS technologiesHeng Wu, Soon-Cheon Seo, et al.IEDM 2017
Conference paperTechnology viable DC performance elements for Si/SiGe channel CMOS FinFTTG. Tsutsui, Ruqiang Bao, et al.IEDM 2016
PaperImproved Air Spacer for Highly Scaled CMOS TechnologyKangguo Cheng, Chanro Park, et al.IEEE Transactions on Electron Devices