Nauman Z. Butt, Kevin McStay, et al.
IEDM 2010
The role of dislocation-dislocation interactions on the relaxation behavior of biaxially stressed semiconductor thin films is considered by including interaction terms in an energy minimization. Both parallel and crossing interactions are considered and energies are calculated for orthogonal arrays of equally spaced 60°misfit dislocations, and it is shown that the parallel interactions can be either attractive or repulsive. The equilibrium misfit dislocation density is shown to be a function of the "cutoff" distance for dislocation interactions in these structures.
Nauman Z. Butt, Kevin McStay, et al.
IEDM 2010
C.-K. Hu, M.B. Small, et al.
MRS Proceedings 1993
Puneet Goyal, Sneha Gupta, et al.
IEEE International SOI Conference 2010
E.F. Crabbé, B. Mcyerson, et al.
Device Research Conference 1993