IN SITU DOPED SILICON VIA LPCVD: INTERACTIONS OF THE DOPANT/SILANE/SILICON SURFACE SYSTEM.
- B.S. Meyerson
- M.L. Yu
- 1983
- ECS Meeting 1983
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138 results for B.S. Meyerson
Phosphorus-Doped Polycrystalline Silicon via LPCVD: II. Surface Interactions of the Silane/Phosphine/Silicon System
- B.S. Meyerson
- M.L. Yu
- 2019
- JES
Phosphorus-Doped Polycrystalline Silicon via LPCVD: I. Process Characterization
- B.S. Meyerson
- W.L. Olbricht
- 2019
- JES
A Study of silicon incorporation in GaAs MOCVD Layers
- E. Veuhoff
- T.F. Kuech
- et al.
- 2019
- JES
low Temperature Silicon Epitaxy by Hot Wall Ultrahigh Vacuum/Low Pressure Chemical Vapor Deposition Techniques: Surface Optimization
- B.S. Meyerson
- E. Ganin
- et al.
- 2019
- JES
Temperature and Bias Effects on the Physical and Tribological Properties of Diamond-Like Carbon
- A. Grill
- V.V. Patel
- et al.
- 2019
- JES
Interface modifications for improving the adhesion of a-c:H films to metals
- A. Grill
- B.S. Meyerson
- et al.
- 2011
- Journal of Materials Research
Optical and tribological properties of heat-treated diamond-like carbon
- A. Grill
- V.V. Patel
- et al.
- 2011
- Journal of Materials Research
Foundation of rf CMOS and SiGe BiCMOS technologies
- James S. Dunn
- David C. Ahlgren
- et al.
- 2003
- IBM J. Res. Dev
Design automation methodology and rf/analog modeling for rf CMOS and SiGe BiCMOS technologies
- David L. Harame
- Kim M. Newton
- et al.
- 2003
- IBM J. Res. Dev