New complimentary metal-oxide semiconductor technology with self-aligned Schottky source/drain and low-resistance T gates
- S. Rishton
- K. Ismail
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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50 results for K.Y. Lee
Weak localization in back-gated S quantum-well wires fabricated by reactive ion etching
- S.J. Koester
- K. Ismail
- et al.
- 1996
- Physical Review B - CMMP
Copper migration and precipitate dissolution in aluminum/copper lines during electromigration testing
- T.M. Shaw
- C.-K. Hu
- et al.
- 1996
- MRS Spring Meeting 1996
Microcolumn based low energy e-beam writing
- C. Stebler
- M. Despont
- et al.
- 1996
- Microelectronic Engineering
Electron beam technology - SEM to microcolumn
- T.H.P. Chang
- M.G.R. Thomson
- et al.
- 1996
- Microelectronic Engineering
Electron-beam microcolumns for lithography and related applications
- T.H.P. Chang
- M.G.R. Thomson
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Electromigration drift velocity in Al-alloy and Cu-alloy lines
- C.-K. Hu
- K.Y. Lee
- et al.
- 1996
- JES
High resolution electron beam lithography using ZEP-520 and KRS resists at low voltage
- D.M. Tanenbaum
- C.W. Lo
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Experimental evaluation of a 20×20 mm footprint microcolumn
- E. Kratschmer
- H.S. Kim
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Electron beam microcolumn for multi-beam applications
- E. Kratschmer
- H.S. Kim
- et al.
- 1995
- IVMC 1995