Thermally Developable, Positive Tone, Oxygen RIE Barrier Resist for Bilayer Lithography
- Hiroshi Ito
- Mitsuru Ueda
- et al.
- 2019
- JES
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127 results for Hiroshi Ito
A fundamental study on dissolution behavior of high-resolution molecular glass photoresists
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2008
- Chemistry of Materials
Thin poly(styrene-block-4-hydroxystyrene) block copolymer films spin-coated directly on topographic prepattern substrates
- Geuntak Lee
- Pil Sung Jo
- et al.
- 2008
- Macromolecules
Penultimate effect in radical copolymerization of 2- trifluoromethylacrylates
- Hiroshi Ito
- Brian C. Trinque
- et al.
- 2008
- J Polym Sci Part A
Characterization and lithographic application of calix[4]resorcinarene derivatives
- Hiroshi Ito
- Tomonari Nakayama
- et al.
- 2007
- Chemistry of Materials
ArF excimer laser resists based on fluoroalcohol
- Hiroshi Ito
- H.D. Truong
- et al.
- 2006
- Polymers for Advanced Technologies
Direct measurement of the counterion distribution within swollen polyelectrolyte films
- Vivek M. Prabhu
- Bryan D. Vogt
- et al.
- 2005
- Langmuir
Characterization of reactive dissolution and swelling of polymer films using a quartz crystal microbalance and visible and infrared reflectance spectroscopy
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2005
- Macromolecules
Poly(methyl α‐trifluoromethylacrylate) as a positive electron beam resist
- C. Grant Willson
- Hiroshi Ito
- et al.
- 2004
- Polymer Engineering & Science
Chemical amplification in the design of dry developing resist materials
- Hiroshi Ito
- C. Grant Willson
- 2004
- Polymer Engineering & Science