Reverse short channel effects in high-k gated nMOSFETs
- J.-P. Han
- S.M. Koo
- et al.
- 2005
- Microelectronics Reliability
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75 results for Christopher P. D’Emic
Thermally robust dual-work function ALD-MN x MOSFETs using conventional CMOS process flow
- D.-G. Park
- Z. Luo
- et al.
- 2004
- VLSI Technology 2004
Systematic study of pFET Vt with Hf-based gate stacks with poly-Si and FUSI gates
- E. Cartier
- V. Narayanan
- et al.
- 2004
- VLSI Technology 2004
Interface trapping properties of nMOSFETs with Al2O 3/SiOxNy/Si(1 0 0) gate dielectric stacks after exposure to ionizing radiation
- J.A. Felix
- H.D. Xiong
- et al.
- 2003
- INFOS 2003
Charge trapping and detrapping in HfO2 high-κ gate stacks
- E. Gusev
- C. D'Emic
- et al.
- 2003
- INFOS 2003
Radiation-Induced Charge Trapping in Thin Al2O 3/SiOxNy/Si(100) Gate Dielectric Stacks
- J.A. Felix
- M.R. Shaneyfelt
- et al.
- 2003
- IEEE TNS
Energy Distribution of Interface Traps in High-K Gated MOSFETs
- J.-P. Han
- E.M. Vogel
- et al.
- 2003
- VLSI Technology 2003
Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications
- E. Gusev
- C. Cabral Jr.
- et al.
- 2003
- Microelectronic Engineering
A selective etching process for chemically inert high-k metal oxides
- Katherine L. Saenger
- Harald F. Okorn-Schmidt
- et al.
- 2002
- MRS Proceedings 2002
Mobility enhancement in strained Si NMOSFETs with HfO2 gate dielectrics
- K. Rim
- E. Gusev
- et al.
- 2002
- VLSI Technology 2002