Recovery study of negative bias temperature instability
- Miaomiao Wang
- Sufi Zafar
- et al.
- 2009
- Microelectronic Engineering
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221 results at Microelectronic Engineering
The evolution of optical and electrical properties of low-k dielectrics under bias stress
- J.M. Atkin
- E. Cartier
- et al.
- 2009
- Microelectronic Engineering
Scaling the MOSFET gate dielectric: From high-k to higher-k? (Invited Paper)
- Martin M. Frank
- SangBum Kim
- et al.
- 2009
- Microelectronic Engineering
Quasi-damascene metal gate/high-k CMOS using oxygenation through gate electrodes
- Changhwan Choi
- Takashi Ando
- et al.
- 2009
- Microelectronic Engineering
Lanthanum germanate as dielectric for scaled Germanium metal-oxide-semiconductor devices
- C. Andersson
- C. Rossel
- et al.
- 2009
- Microelectronic Engineering
Interfacial layer optimization of high-k/metal gate stacks for low temperature processing
- Barry P. Linder
- Vijay Narayanan
- et al.
- 2009
- Microelectronic Engineering
Atomic layer deposition of Ge2Sb2Te5 thin films
- Mikko Ritala
- Viljami Pore
- et al.
- 2009
- Microelectronic Engineering
CMOS compatible cost-efficient fabrication of SOI grating couplers
- Jens Bolten
- Jens Hofrichter
- et al.
- 2009
- Microelectronic Engineering
A mass-balanced through-wafer electrostatic x/y-scanner for probe data storage
- J.B.C. Engelen
- H. Rothuizen
- et al.
- 2009
- Microelectronic Engineering
Phase change materials and their application to random access memory technology
- Simone Raoux
- Robert M. Shelby
- et al.
- 2008
- Microelectronic Engineering