Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
ESD robustness of 4 kV HBM is achieved in CMOS-on-SOI ESD protection networks in an advanced sub-0.25 μm mainstream CMOS-on-SOI technology. Design layout, body contact, floating-gate effects and novel ESD protection implementations are discussed. © 1998 Elsevier Science B.V.
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Ronald Troutman
Synthetic Metals
T.N. Morgan
Semiconductor Science and Technology