Ultra-low power 0.1 μm CMOS
- Y. Mii
- S.J. Wind
- et al.
- 1994
- VLSI Technology 1994
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53 results for Jim Bucchignano
POLYSILOXANE RESIST AS A PROBE FOR ENERGY DEPOSITED IN ELECTRON BEAM EXPOSED RESISTS.
- D. Kern
- J. Paraszczak
- et al.
- 1982
- Microcircuit Engineering 1982
Trilayer process for T -gate and Γ-gate lithography using ternary developer and proximity effect correction superposition
- Leonidas E. Ocola
- James Bucchignano
- et al.
- 2022
- Journal of Vacuum Science and Technology B
Dot-matrix marks for dynamic overlay measurements in electron beam lithography
- Ernst Kratschmer
- James J. Bucchignano
- et al.
- 2013
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Graphene radio frequency devices on flexible substrate
- Wenjuan Zhu
- Damon B. Farmer
- et al.
- 2013
- Applied Physics Letters
Pattern transfer of directed self-assembly patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Hydrogen silsesquioxane-based hybrid electron beam and optical lithography for high density circuit prototyping
- M. Guillorn
- J. Chang
- et al.
- 2009
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Hybrid lithography: The marriage between optical and e-beam lithography. A method to study process integration and device performance for advanced device nodes
- Steven Steen
- Sharee J. McNab
- et al.
- 2006
- Microelectronic Engineering
Two gates are better than one
- P. Solomon
- K.W. Guarini
- et al.
- 2003
- IEEE Circuits and Devices Magazine